About this scholarly article

[Proceedings 1991] Third International Conference Indium Phosphide and Related Materials - Effects of PCl/sub 3/ addition on ECR CH/sub 4//H/sub 2//Ar plasma etching of InP and InGaAs by Pearton, S.J.; Katz, A.; Chakrabarti, U.K. is a scholarly article available to read on EtoBox.

Author

Pearton, S.J.; Katz, A.; Chakrabarti, U.K.

Publisher

IEEE

Published

1991

Language

EN