About this scholarly article

2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Impact of gate oxide complex band structure on n-channel III–V FinFETs by Crum, Dax M.; Valsaraj, Amithraj; Register, Leonard F.; Banerjee, Sanjay K.; Sahu, Bhagawan; Krivakopic, Zoran; Banna, Srinivasa; Nayak, Deepak is a scholarly article available to read on EtoBox.

Author

Crum, Dax M.; Valsaraj, Amithraj; Register, Leonard F.; Banerjee, Sanjay K.; Sahu, Bhagawan; Krivakopic, Zoran; Banna, Srinivasa; Nayak, Deepak

Publisher

IEEE

Published

2015

Language

EN