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The synthesis of CrSiN film deposited using magnetron sputtering system by H.Y. Lee; W.S. Jung; J.G. Han; S.M. Seo; J.H. Kim; Y.H. Bae is a Engineering article available to read on EtoBox.

What is The synthesis of CrSiN film deposited using magnetron sputtering system about?

The formation and properties of CrSiN thin films deposited on Si using closed field unbalanced magnetron sputtering system are studied. In this paper, the effect of Si concentration in the CrN films is investigated. Film hardening is generated by the two cases that result from formation of solid solution and formation of nc-CrN/a-Si 3 N 4 . Microstructure of the films due to the Si concentration is measured by XRD and TEM. Chemical composition of the films is investigated using GDOES. Also, XPS is analyzed for the examination of the bonding structure of the films. During the AFM, growth mode change from columnar to amorphous is confirmed. Hardness of the film is estimated by nano-indentation test. Maximum hardness value according to the various Si concentration is obtained at 32GPa.

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Author

H.Y. Lee; W.S. Jung; J.G. Han; S.M. Seo; J.H. Kim; Y.H. Bae

Publisher

Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)

Published

2005

Language

EN

Field

Engineering (Physical Sciences)