About this scholarly article

A study of electrically active defects created in p-InP by CH[sub 4]:H[sub 2] reactive ion etching by Goubert, L.; Van Meirhaeghe, R. L.; Clauws, P.; Cardon, F.; Van Daele, P. is a scholarly article available to read on EtoBox.

Author

Goubert, L.; Van Meirhaeghe, R. L.; Clauws, P.; Cardon, F.; Van Daele, P.

Publisher

American Institute of Physics; AIP Publishing; Publons (ISSN 0021-8979)

Published

1997

Language

EN