About this scholarly article

Proceedings of 11th International Conference on Ion Implantation Technology - Gate oxide damage measured with a unique GOI structure by Sam Leung, ; Ito, H.; Chulhee Park, ; Yound Hwan Kim, ; Yong Seon Lee, is a scholarly article available to read on EtoBox.

Author

Sam Leung, ; Ito, H.; Chulhee Park, ; Yound Hwan Kim, ; Yong Seon Lee,

Publisher

IEEE

Published

1997

Language

EN