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About this Engineering article
The investigation on the microstructure of magnetron sputtering ion plated Al/Cu film: The effect of substrate negative bias voltage by B.Q. Chen; F.J. Wang; Y.K. Wang; J.X. Wang; H.M. Han; C.N. Wang; T.Y. Niu; H.W. Gao is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- B.Q. Chen; F.J. Wang; Y.K. Wang; J.X. Wang; H.M. Han; C.N. Wang; T.Y. Niu; H.W. Gao
- Publisher
- Elsevier Science; Elsevier ; Pergamon Press Ltd.; Elsevier BV (ISSN 0036-9748)
- Published
- 1988
- Language
- EN
- Field
- Engineering (Physical Sciences)