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Cyclic Voltammetric Deposition of Hydrous Ruthenium Oxide for Electrochemical Capacitors: Effects of Codepositing Iridium Oxide by Chi-Chang Hu; Kwang-Huei Chang is a Engineering article available to read on EtoBox.
What is Cyclic Voltammetric Deposition of Hydrous Ruthenium Oxide for Electrochemical Capacitors: Effects of Codepositing Iridium Oxide about?
The electrochemical and textural characteristics of various hydrous ruthenium -iridium oxides (denoted as (Ru+Ir)O x •nH 2 O) grown by cyclic voltammetry (CV) were systematically studied for the application of electrochemical (EC) capacitors. The faradaic pseudocapacitance of (Ru + Ir)O x •nH 2 O reached the maximum when the depositing solution contained 5 mM RuCl 3 •xH 2 O and 1 mM IrCl 3 •xH 2 O. The linear dependence of C cp on C q\* measured respectively by chronopotentiometry (CP) and CV at various (Ru +Ir)O x •nH 2 O deposits was found to be independent of the compositions of oxides. The intercalation of IrO x •nH 2 O within the RuO x •nH 2 O matrix promoted the utilization of electroactive oxyruthenium species while the presence of IrCl 3 •xH 2 O depressed the rate of (Ru+ Ir)O x •nH 2 O deposition. These effects were further supported by the textural results of these binary hydrous oxides examined by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS).
Who reads Cyclic Voltammetric Deposition of Hydrous Ruthenium Oxide for Electrochemical Capacitors: Effects of Codepositing Iridium Oxide?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Chi-Chang Hu; Kwang-Huei Chang
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0013-4686)
- Published
- 2000
- Language
- EN
- Field
- Engineering (Physical Sciences)