About this scholarly article

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Enhancement of unified mask data formats for EB writers by Suzuki, Toshio; Staud, Wolfgang; Weed, J. Tracy; Hirumi, Junji; Yoshioka, Nobuyuki; Hojyo, Yutaka; Kawase, Yuichi; Sakamoto, Shinji; Kuriyama, Koki; Narukawa, Syogo; Houga, Morihisa is a scholarly article available to read on EtoBox.

Author

Suzuki, Toshio; Staud, Wolfgang; Weed, J. Tracy; Hirumi, Junji; Yoshioka, Nobuyuki; Hojyo, Yutaka; Kawase, Yuichi; Sakamoto, Shinji; Kuriyama, Koki; Narukawa, Syogo; Houga, Morihisa

Publisher

SPIE

Published

2004