About this scholarly article

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Photoresist materials: a historical perspective by Willson, C. Grant; Dammel, Ralph R.; Reiser, Arnost; Tarascon-Auriol, Regine G. is a scholarly article available to read on EtoBox.

Author

Willson, C. Grant; Dammel, Ralph R.; Reiser, Arnost; Tarascon-Auriol, Regine G.

Publisher

SPIE

Published

1997