Skip to content

Opening book details…

About this Engineering article

Study of the Electrochemical Performance of Sputtered Si[sub 1−x]Sn[sub x] Films by Hatchard, T. D.; Dahn, J. R. is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Hatchard, T. D.; Dahn, J. R.
Publisher
The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
Published
2004
Language
EN
Field
Engineering (Physical Sciences)

More by Hatchard, T. D.; Dahn, J. R.

Browse all works by Hatchard, T. D.; Dahn, J. R.