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About this Engineering article
Mask-aligner Lithography Using a Continuous-wave Diode Laser Frequency-quadrupled to 193 Nm by Kirner, Raoul; Vetter, Andreas; Opalevs, Dmitrijs; Gilfert, Christian; Scholz, Matthias; Leisching, Patrick; Scharf, Toralf; Noell, Wilfried; Rockstuhl, Carsten; Voelkel, Reinhard is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Kirner, Raoul; Vetter, Andreas; Opalevs, Dmitrijs; Gilfert, Christian; Scholz, Matthias; Leisching, Patrick; Scharf, Toralf; Noell, Wilfried; Rockstuhl, Carsten; Voelkel, Reinhard
- Publisher
- Optical Society of America; The Optical Society; Washington DC: Optical Society of America, 1997- (ISSN 1094-4087)
- Published
- 2018
- Language
- EN
- Field
- Engineering (Physical Sciences)