About this scholarly article

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Demolding strategy to improve the hot embossing throughput by Leveder, Tanguy; Lercel, Michael J.; Landis, Stefan; Davoust, Laurent; Soulan, Sebastien; Chaix, Nicolas is a scholarly article available to read on EtoBox.

Author

Leveder, Tanguy; Lercel, Michael J.; Landis, Stefan; Davoust, Laurent; Soulan, Sebastien; Chaix, Nicolas

Publisher

SPIE

Published

2007

Language

EN