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About this Engineering article

In situ transmission electron microscopy measurements of the electrical and structural properties of strained layer GeSi/Si p–n junctions by Ross, F. M. is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Ross, F. M.
Publisher
AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
Published
1992
Language
EN
Field
Engineering (Physical Sciences)

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