About this Engineering article
Effects of nitridation and annealing on interface properties of thermally oxidized SiO2/SiC metal–oxide–semiconductor system by Lai, P. T.; Chakraborty, Supratic; Chan, C. L.; Cheng, Y. C. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Lai, P. T.; Chakraborty, Supratic; Chan, C. L.; Cheng, Y. C.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2000
- Field
- Engineering (Physical Sciences)