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About this Materials Science article
Optimizing HiPIMS pressure for deposition of high-k (k=18.3) amorphous HfO2 by Ganesan, R.; Murdoch, B.J.; Partridge, J.G.; Bathgate, S.; Treverrow, B.; Dong, X.; Ross, A.E.; McCulloch, D.G.; McKenzie, D.R.; Bilek, M.M.M. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Ganesan, R.; Murdoch, B.J.; Partridge, J.G.; Bathgate, S.; Treverrow, B.; Dong, X.; Ross, A.E.; McCulloch, D.G.; McKenzie, D.R.; Bilek, M.M.M.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
- Published
- 2016
- Language
- EN
- Field
- Materials Science (Physical Sciences)