About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - Analysis of EUV mask durability under various absorber etch conditions by Lee, Dong Wook; Jo, Sang Jin; Oh, Sung Hyun; Ha, Tae Joong; Kim, Sang Pyo; Yim, Dong Gyu; Faure, Thomas B.; Ackmann, Paul W. is a scholarly article available to read on EtoBox.

Author

Lee, Dong Wook; Jo, Sang Jin; Oh, Sung Hyun; Ha, Tae Joong; Kim, Sang Pyo; Yim, Dong Gyu; Faure, Thomas B.; Ackmann, Paul W.

Publisher

SPIE

Published

2013