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About this Materials Science article
Large spontaneous nucleation rate in implanted polycrystalline silicon films on SiO2 by Iverson, R.B.; Reif, R. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Iverson, R.B.; Reif, R.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0167-577X)
- Published
- 1987
- Language
- EN
- Field
- Materials Science (Physical Sciences)