About this scholarly article

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Mask calibration dominated methodology for OPC matching by Zhu, Liang; Naber, Robert J.; Kawahira, Hiroichi; Lu, Mark; King, Dion; Gu, Yili; Yang, Steve; Melvin III, Lawrence S. is a scholarly article available to read on EtoBox.

Author

Zhu, Liang; Naber, Robert J.; Kawahira, Hiroichi; Lu, Mark; King, Dion; Gu, Yili; Yang, Steve; Melvin III, Lawrence S.

Publisher

SPIE

Published

2007

Language

EN