About this scholarly article

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Development of voltage contrast defect inspection technique for line monitoring 300mm ULSI hp90 logic contact layer by Hayashi, Hiroyuki; Silver, Richard M.; Fukunaga, Yuji; Yamasaki, Masayoshi; Nagai, Takamitsu; Yamazaki, Yuichiro is a scholarly article available to read on EtoBox.

Author

Hayashi, Hiroyuki; Silver, Richard M.; Fukunaga, Yuji; Yamasaki, Masayoshi; Nagai, Takamitsu; Yamazaki, Yuichiro

Publisher

SPIE

Published

2005