About this scholarly article

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Metrology, Inspection, and Process Control for Microlithography X - Calibration of scanning electron microscope magnification standards SRM484 by Fu, Joseph; Vorburger, Theodore V.; Ballard, David B.; Jones, Susan K. is a scholarly article available to read on EtoBox.

Author

Fu, Joseph; Vorburger, Theodore V.; Ballard, David B.; Jones, Susan K.

Publisher

SPIE

Published

1996

Language

EN