About this scholarly article

SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - University-industry relations: what do we do now? by Armstrong, John A.; Seeger, David E. is a scholarly article available to read on EtoBox.

Author

Armstrong, John A.; Seeger, David E.

Publisher

SPIE

Published

1996

Language

EN