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About this Engineering article
Effect of substrate temperature on sidewall erosion in high-aspect-ratio Si hole etching employing HBr/SF 6 /O 2 plasma by Sakai, Itsuko; Yahashi, Katsunori; Shimonishi, Satoshi; Sekine, Makoto; Hori, Masaru is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Sakai, Itsuko; Yahashi, Katsunori; Shimonishi, Satoshi; Sekine, Makoto; Hori, Masaru
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2018
- Field
- Engineering (Physical Sciences)