About this scholarly article

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Improved Bake Latitude Organic Anti-Reflective Coatings for High Resolution Metallisation Lithography by Martin, B.; Odell, A. N.; Lamb III, J. E.; Reichmanis, Elsa is a scholarly article available to read on EtoBox.

Author

Martin, B.; Odell, A. N.; Lamb III, J. E.; Reichmanis, Elsa

Publisher

SPIE

Published

1989