About this Engineering article
Chemical influence of inert gas on the thin film stress in plasma-enhanced chemical vapor deposited a-SiN: H films by Loboda, M. J.; Seifferly, J. A. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Loboda, M. J.; Seifferly, J. A.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP); Research Square (ISSN 0884-2914)
- Published
- 1996
- Field
- Engineering (Physical Sciences)