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About this Engineering article
Low pressure microwave electron cyclotron resonance plasma deposition of amorphous Ta2O5 films by Laviale, D.; Oberlin, J. C.; Devine, R. A. B. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Laviale, D.; Oberlin, J. C.; Devine, R. A. B.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1994
- Language
- EN
- Field
- Engineering (Physical Sciences)