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What is Titanium Tetrachloride Properties and Uses about?

This document provides information about titanium tetrachloride (TiCl4), which is commonly used as a precursor for depositing titanium nitride (TiN) thin films via chemical vapor deposition (CVD) or atomic layer deposition (ALD). TiCl4 is a colorless liquid with a boiling point of 136.5°C that reacts violently with water. It can be delivered via bubbler or direct liquid injection for CVD or ALD processes. Air Liquide offers high-purity TiCl4 in sealed canisters for use as a TiN precursor.

Author

witanto90

Language

EN