Opening book details…
About this Engineering article
Metal-organic chemical vapor deposition/open flow thallium annealing route to epitaxial Tl2Ba2Ca2Cu3O10 thin films by Hinds, B. J.; Schulz, D. L.; Neumayer, D. A.; Han, B.; Marks, T. J.; Wang, Y. Y.; Dravid, V. P.; Schindler, J. L.; Hogan, T. P.; Kannewurf, C. R. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hinds, B. J.; Schulz, D. L.; Neumayer, D. A.; Han, B.; Marks, T. J.; Wang, Y. Y.; Dravid, V. P.; Schindler, J. L.; Hogan, T. P.; Kannewurf, C. R.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1994
- Language
- EN
- Field
- Engineering (Physical Sciences)