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About this Engineering article
Low-temperature deposition of hydrogenated amorphous silicon (a-Si:H): Control of polyhydride incorporation and its effects on thin film properties by G. Lucovsky; G.N. Parsons; C. Wang; B.N. Davidson; D.V. Tsu is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- G. Lucovsky; G.N. Parsons; C. Wang; B.N. Davidson; D.V. Tsu
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0379-6787)
- Published
- 1989
- Language
- EN
- Field
- Engineering (Physical Sciences)
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