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About this Engineering article
Boron Diffusion and Activation during Heat Treatment in Heavily Doped Polysilicon Thin Films for P+ Metal-Oxide-Semiconductor Transistors Gates by Mahamdi, Ramdane; Mansour, Farida; Scheid, Emmanuel; Boyer, Pierre Temple; Jalabert, Laurent is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Mahamdi, Ramdane; Mansour, Farida; Scheid, Emmanuel; Boyer, Pierre Temple; Jalabert, Laurent
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2001
- Field
- Engineering (Physical Sciences)