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Photofabrication of Surface Relief Gratings from Azobenzene Containing Perfluorocyclobutane Aryl Ether Polymer by Chaemin Chun; Jieun Ghim; Mi‐Jeong Kim; Dong Yu Kim is a Materials Science article available to read on EtoBox.

What is Photofabrication of Surface Relief Gratings from Azobenzene Containing Perfluorocyclobutane Aryl Ether Polymer about?

## Abstract An azobenzene based perfluorocyclobutane (PFCB) aryl ether polymer, poly[4‐(phenylazo)triphenylamine‐1,2‐hexafluorocyclobutyl ether], was synthesized by using a palladium catalyzed amination reaction and the 2π + 2π cyclodimerization of 4‐[(trifluorovinyl)oxy]bromobenzene. This polymer was designed and synthesized to permit azo chromophores to be incorporated, thus introducing photoinduced dynamic behavior into the PFCB containing polymer structure. The polymer exhibited a T~g~ of about 122 °C, and the maximum absorption of the azo chromophores was 407 nm in the film state. A thin film was prepared through a spin coating process, and the rapid growth of diffraction efficiency was then achieved by irradiation with an interference beam. The efficient formation of holographic surface relief gratings was also verified from AFM images, which show regularly defined and aligned grating structures. © 2005 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 43: 3525–3532, 2005

Who reads Photofabrication of Surface Relief Gratings from Azobenzene Containing Perfluorocyclobutane Aryl Ether Polymer?

Author

Chaemin Chun; Jieun Ghim; Mi‐Jeong Kim; Dong Yu Kim

Publisher

John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley (ISSN 0887-624X)

Published

2005

Language

EN

Field

Materials Science (Physical Sciences)