About this scholarly article

2010 22nd International Conference on Indium Phosphide and Related Materials (IPRM) - Selective area growth of InP on nano-patterned SiO2/Si(100) substrates by molecular beam epitaxy by Hasegawa, S.; Yamano, A.; Ahn, N. S.; Cha, N. G.; Kanki, T.; Tanaka, H.; Asahi, H. is a scholarly article available to read on EtoBox.

Author

Hasegawa, S.; Yamano, A.; Ahn, N. S.; Cha, N. G.; Kanki, T.; Tanaka, H.; Asahi, H.

Publisher

IEEE

Published

2010