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About this Materials Science article

Structure and chemical composition of glow discharge Si:H,Cl films. The role of gas phase argon addition by Giovanni Bruno; Pio Capezzuto; Grazia Cicala; Francesco Cramarossa is a Materials Science article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Materials Science.

Author
Giovanni Bruno; Pio Capezzuto; Grazia Cicala; Francesco Cramarossa
Publisher
Elsevier Science; Elsevier ; Elsevier BV (ISSN 0022-3093)
Published
1985
Language
EN
Field
Materials Science (Physical Sciences)

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