About this scholarly article

2011 IEEE International Interconnect Technology Conference - Effect of oxygen diffusion into TiN on resistance switching characteristics of ZrO2 films with annealing temperatures by Kim, Jonggi; Lee, Sunghoon; Na, Heedo; Lee, Kyumin; Sohn, Hyunchul is a scholarly article available to read on EtoBox.

Author

Kim, Jonggi; Lee, Sunghoon; Na, Heedo; Lee, Kyumin; Sohn, Hyunchul

Publisher

IEEE

Published

2011

Language

EN