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About this Engineering article
Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy by Dhakal, Dileep; Assim, Khaybar; Lang, Heinrich; Bruener, Philipp; Grehl, Thomas; Georgi, Colin; Waechtler, Thomas; Ecke, Ramona; Schulz, Stefan E.; Gessner, Thomas is a Engineering article available to read on EtoBox.
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- Author
- Dhakal, Dileep; Assim, Khaybar; Lang, Heinrich; Bruener, Philipp; Grehl, Thomas; Georgi, Colin; Waechtler, Thomas; Ecke, Ramona; Schulz, Stefan E.; Gessner, Thomas
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 2016
- Field
- Engineering (Physical Sciences)