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About this Chemistry article
Mechanisms of SiO2 Etching: Ab Initio Calculations on the Reactions of CFm- (m = 3−1) and NFn- (n = 2, 1) Ions with Local Surface Models by Jenichen, Arndt is a Chemistry article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Chemistry.
- Author
- Jenichen, Arndt
- Publisher
- American Chemical Society; American Chemical Society (ACS); Williams & Wilkins Co. (ISSN 0022-3654)
- Published
- 1997
- Field
- Chemistry (Physical Sciences)