Opening book details…
About this Engineering article
Fluorine in low-pressure chemical vapor deposited W/Si contact structures: Inclusion and thermal stability by Whitlow, H. J.; Eriksson, Th.; Östling, M.; Petersson, C. S.; Keinonen, J.; Anttila, A is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Whitlow, H. J.; Eriksson, Th.; Östling, M.; Petersson, C. S.; Keinonen, J.; Anttila, A
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1987
- Language
- EN
- Field
- Engineering (Physical Sciences)