About this scholarly article

2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - High density epitaxial unwanted growth and its effect on planarization in FINFET process by Jao, Pit Fee; Tsao, Chia Hao; Popova, Ludmila; Yarramsetty, Jagadeesh; Chen, Brad; Shintri, Shashidhar; Hariharaputhiran, Mariappan; Kolagunta, Venkat is a scholarly article available to read on EtoBox.

Author

Jao, Pit Fee; Tsao, Chia Hao; Popova, Ludmila; Yarramsetty, Jagadeesh; Chen, Brad; Shintri, Shashidhar; Hariharaputhiran, Mariappan; Kolagunta, Venkat

Publisher

IEEE

Published

2018

Language

EN