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About this Engineering article
Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings by Jhaveri, T.; Rovner, V.; Liebmann, L.; Pileggi, L.; Strojwas, A.J.; Hibbeler, J.D. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Jhaveri, T.; Rovner, V.; Liebmann, L.; Pileggi, L.; Strojwas, A.J.; Hibbeler, J.D.
- Publisher
- IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0278-0070)
- Published
- 2010
- Field
- Engineering (Physical Sciences)