About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - New method to determine process window considering pattern failure by Yang, Seung-Hune; Montgomery, M. Warren; Maurer, Wilhelm; Moon, Seongho; Ser, Junghoon; Kim, Young-Chang; Choi, Sung-Woon; Kang, Chang-Jin is a scholarly article available to read on EtoBox.

Author

Yang, Seung-Hune; Montgomery, M. Warren; Maurer, Wilhelm; Moon, Seongho; Ser, Junghoon; Kim, Young-Chang; Choi, Sung-Woon; Kang, Chang-Jin

Publisher

SPIE

Published

2010

Language

EN