About this scholarly article

SPIE Proceedings [SPIE Photomask Japan '94 - Kawasaki City, Kanagawa, Japan (Friday 22 April 1994)] Photomask and X-Ray Mask Technology - Development of 0.35-μm generation reticles using advanced mask blanks by Tanaka, Yoshiyuki; Matsuda, M.; Tanaka, Tsuyoshi; Kobayashi, Ryoichi; Yoshihara, Hideo is a scholarly article available to read on EtoBox.

Author

Tanaka, Yoshiyuki; Matsuda, M.; Tanaka, Tsuyoshi; Kobayashi, Ryoichi; Yoshihara, Hideo

Publisher

SPIE

Published

1994

Language

EN