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ToF-SIMS imaging and depth profiling of HeLa cells treated with bromodeoxyuridine by Jeremy Brison; Danielle S. W. Benoit; Shin Muramoto; Michael Robinson; Patrick S. Stayton; David G. Castner is a Engineering article available to read on EtoBox.

What is ToF-SIMS imaging and depth profiling of HeLa cells treated with bromodeoxyuridine about?

## Abstract Time‐of‐flight (ToF) SIMS 2D images and molecular depth profiles of human HeLa cells treated with bromodeoxyuridine (BrdU) were acquired in the dual beam mode (Bi~3~^+^ analysis beam, C~60~^+^ etching beam). Several preparation protocols were investigated and were compared to a simple wash‐and‐dry method. The feasibility of using C~60~ to clean the samples prior to imaging with Bi was also investigated quantitatively by calibrating full depth profiles of the cells using atomic force microscopy. BrdU was used as a marker for the cell nucleus, facilitating identification and localization of subcellular features during depth profiling. Results show that C~60~ can be used to remove the surface contamination and to access different layers within the cells for 2D imaging. For a 1 nA, 10 keV C~60~^+^ beam incident at 45° and rastered over a 500 × 500 μm^2^ area, ∼1 nm of biological material was sputtered every second. Our results show that HeLa cells were completely removed after etching with 1.3 × 10^15^ C~60~^+^ ions per cm^2^, giving an average etching rate of 3.9 nm for every 10^13^ C~60~ per cm^2^ at 10 keV and 45° incidence. Copyright © 2010 John Wiley & Sons, Ltd.

Who reads ToF-SIMS imaging and depth profiling of HeLa cells treated with bromodeoxyuridine?

Author

Jeremy Brison; Danielle S. W. Benoit; Shin Muramoto; Michael Robinson; Patrick S. Stayton; David G. Castner

Publisher

John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Inc.; Wiley; Research Square (ISSN 0142-2421)

Published

2010

Language

EN

Field

Engineering (Physical Sciences)