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Structural and Mechanical Properties of Nanostructured TiAlCrN Thin Films Deposited by Cathodic Arc Deposition by N. Vattanaprateep; N. Panich; S. Surinphong; S. Tungasmita; P. Wangyao is a Engineering article available to read on EtoBox.

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## Abstract This work has aims to study and develop the novel nanostructural quaternary thin film material for cutting tools and other applications with both high hardness value and good thermal stability at high temperature. The quaternary compound of TiAlCrN superhard coating material was deposited on tungsten carbide (WC-Co) substrates using cathodic arc deposition techniques at the deposition temperature of 623 K. The structures of the coatings were fundamentally examined by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectrometer (EDS), and atomic force microscopy (AFM). The coating hardness and elastic modulus tests were performed and investigated by nanoindentation testing method. The maximum hardness and elastic modulus values as measured by nanoindentation tests are at 53 GPa and 887 GPa, respectively. Scratch tests were performed on thin films deposited in various conditions. The critical loads to the coating failure of the resultant coatings are above 75 N.

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Author

N. Vattanaprateep; N. Panich; S. Surinphong; S. Tungasmita; P. Wangyao

Publisher

Walter de Gruyter GmbH

Published

2013

Language

EN

Field

Engineering (Physical Sciences)