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About this Engineering article
Use of Very Low Energy in Situ Focused Ion Beams for Three-dimensional Dopant Patterning During Molecular Beam Epitaxial Growth by P. J. A. Sazio is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- P. J. A. Sazio
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 1996
- Field
- Engineering (Physical Sciences)