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Can I read Effect of target self-bias on carbon nitride thin films deposited by RF magnetron sputtering on EtoBox?
Effect of target self-bias on carbon nitride thin films deposited by RF magnetron sputtering by O. Durand-Drouhin; M. Lejeune; M. Clin; D. Ballutaud; M. Benlahsen is a Physics and Astronomy article available to read on EtoBox.
What is Effect of target self-bias on carbon nitride thin films deposited by RF magnetron sputtering about?
Analysis of carbon nitride ®lms (CN x ) deposited by RF magnetron sputtering on crystalline silicon, under different target selfbias, is reported. The properties of ®lms were determined in their as-deposited state using X-ray photoelectron spectroscopy (XPS), IR absorption, transmission spectroscopy and residual stress measurements. The presence of various types of C±N bonds, as well as of hydrogen and oxygen, is revealed. A good correlation is observed between the variation of N/C ratio, the optical gap E 04 and the internal stress as a function of the target bias. The optical gap E 04 decrease is discussed in terms of N/C ratio evolution, the sp 2 bond content and the local distortions of the sp 2 bonds.
Who reads Effect of target self-bias on carbon nitride thin films deposited by RF magnetron sputtering?
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- O. Durand-Drouhin; M. Lejeune; M. Clin; D. Ballutaud; M. Benlahsen
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0038-1098)
- Published
- 2001
- Language
- EN
- Field
- Physics and Astronomy (Physical Sciences)