About this scholarly article

2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers - Statistical demonstration of silicide-like uniform and ultra-low specific contact resistivity using a metal/high-k/Si stack in a sidewall contact test structure by Majumdar, K.; Clark, R.; Ngai, T.; Tapily, K.; Consiglio, S.; Bersch, E.; Matthews, K.; Stinzianni, E.; Trickett, Y.; Nakamura, G.; Wajda, C.; Leusink, G.; Chong, H.; Kaushik, V.; Woicik, J.; Hobbs, C.; Kirsch, P. is a scholarly article available to read on EtoBox.

Author

Majumdar, K.; Clark, R.; Ngai, T.; Tapily, K.; Consiglio, S.; Bersch, E.; Matthews, K.; Stinzianni, E.; Trickett, Y.; Nakamura, G.; Wajda, C.; Leusink, G.; Chong, H.; Kaushik, V.; Woicik, J.; Hobbs, C.; Kirsch, P.

Publisher

IEEE

Published

2014

Language

EN