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Significant Hall–Petch effect in micro-nanocrystalline electroplated copper controlled by SPS concentration by Kao, Yu-Jyun (author);Li, Yu-Ju (author);Shen, Yu-An (author);Chen, Chih-Ming (author) is a Biochemistry, Genetics and Molecular Biology article available to read on EtoBox.

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## Abstract Electroplated Cu has been extensively applied in advanced electronic packaging, and its mechanical properties are critical for reliability. In this study, Cu foils fabricated through electroplating with various bis-(3-sulfopropyl) disulfide (SPS) concentrations are examined using tensile tests. The SPS concentration affects the grain size of the electroplated Cu foils, resulting in different mechanical properties. A significant Hall–Petch effect, $${\sigma }\_{y} = 197.4 + 0.12{d}^{\frac{-1}{2}}$$ σ y = 197.4 + 0.12 d - 1 2 , is demonstrated for the electroplated Cu foils. The different concentrations of impurities identified through time-of-flight secondary ion mass spectrometry correspond to the different grain sizes, determining the transgranular and intergranular fracture during the tensile test. The results demonstrate that the SPS concentration controlling the microstructures of the electroplated Cu results in a Hall–Petch effect on the mechanical properties of the electroplated Cu foils.

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Author

Kao, Yu-Jyun (author);Li, Yu-Ju (author);Shen, Yu-An (author);Chen, Chih-Ming (author)

Publisher

Springer Science and Business Media LLC

Published

2023

Language

EN

Field

Biochemistry, Genetics and Molecular Biology (Life Sciences)