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About this Engineering article
Nanoimprint Lithography: Methods and Material Requirements by L. J. Guo is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- L. J. Guo
- Publisher
- John Wiley and Sons; Wiley (John Wiley & Sons); Wiley-Blackwell; Wiley; Research Square (ISSN 0935-9648)
- Published
- 2007
- Language
- EN
- Field
- Engineering (Physical Sciences)