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Bioremediation through rhizosphere technology : developed from a symposium sponsored by the Division of Agrochemicals and the Division of Environmental Chemistry at the 206th national meeting of the American Chemical Society, Chicago, Illinois, August 23-27, 1993 by TODD A. ANDERSON; JOEL R. COATS; Jean-Marc Bollag; Tawna Mertz; Lewis Otjen; Barbara T. Walton; Elizabeth A. Guthrie; Anne M. Hoylman; Andrei L. Barkovskii; Marie-Louise Boullant; Jacques Balandreau; Kyo Sato; David B. Knaebel; J. Robie Vestal; Jodi R. Shann; J. J. Boyle; Mary M. Perez; Theodore R. Johnson; Russell F. Christman; Paula K. Donnelly; John S. Fletcher; Jerzy Dec; Lawrence C. Davis; N. Muralidharan; V. P. Visser; C. Chaffin; W. G. Fateley; L. E. Erickson; R. M. Hammaker; J. W. Watkins; D. L. Sorensen; R. C. Sims; A. P. Schwab; M. K. Banks; X. Qiu; S. I. Shah; E. W. Kendall; M. C. Engelke; Robert E. Hoagland; Robert M. Zablotowicz; Martin A. Locke; Ellen L. Kruger; Michael A. Cole; Xianzhong Liu; Liu Zhang is a nonfiction available to read on EtoBox.

What is Bioremediation through rhizosphere technology : developed from a symposium sponsored by the Division of Agrochemicals and the Division of Environmental Chemistry at the 206th national meeting of the American Chemical Society, Chicago, Illinois, August 23-27, 1993 about?

<br> The first compilation of research on microbial degradation of contaminants in the rhizosphere. Discusses the interactions between microorganisms, plants, and chemicals in the rhizosphere. Examines the degradation of industrial chemicals, including polycyclic aromatic hydrocarbons, pentachlorophenol, and trichloroethylene, as well as the degradation of pesticides in the rhizosphere. Two review chapters provide overviews of bioremediation and rhizosphere microbiology.

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Author

TODD A. ANDERSON; JOEL R. COATS; Jean-Marc Bollag; Tawna Mertz; Lewis Otjen; Barbara T. Walton; Elizabeth A. Guthrie; Anne M. Hoylman; Andrei L. Barkovskii; Marie-Louise Boullant; Jacques Balandreau; Kyo Sato; David B. Knaebel; J. Robie Vestal; Jodi R. Shann; J. J. Boyle; Mary M. Perez; Theodore R. Johnson; Russell F. Christman; Paula K. Donnelly; John S. Fletcher; Jerzy Dec; Lawrence C. Davis; N. Muralidharan; V. P. Visser; C. Chaffin; W. G. Fateley; L. E. Erickson; R. M. Hammaker; J. W. Watkins; D. L. Sorensen; R. C. Sims; A. P. Schwab; M. K. Banks; X. Qiu; S. I. Shah; E. W. Kendall; M. C. Engelke; Robert E. Hoagland; Robert M. Zablotowicz; Martin A. Locke; Ellen L. Kruger; Michael A. Cole; Xianzhong Liu; Liu Zhang

Publisher

An American Chemical Society Publication

Published

1994

Language

EN

ISBN

9780841229426

Category

nonfiction

Subjects

Engineering, Mathematics, Technology