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About this Engineering article
Localized Epitaxial Growth of IrSi3, ReSi2, and Rh3Si4 on (111) and (00l)Si by Chu, J.J.; Chen, L.J.; Tu, K.N. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Chu, J.J.; Chen, L.J.; Tu, K.N.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 1988
- Field
- Engineering (Physical Sciences)