About this scholarly article

SPIE Proceedings [SPIE Micro - DL tentative - San Jose, CA (Friday 1 March 1991)] Integrated Circuit Metrology, Inspection, and Process Control V - Phase-shift mask technology: requirements for e-beam mask lithography by Dunbrack, Steven K.; Muray, Andrew J.; Sauer, Charles A.; Lozes, Richard L.; Nistler, John L.; Arnold, William H.; Kyser, David F.; Minvielle, Anna Maria; Preil, Moshe E.; Singh, Bhanwar; Templeton, Michael K.; Arnold, William H. is a scholarly article available to read on EtoBox.

Author

Dunbrack, Steven K.; Muray, Andrew J.; Sauer, Charles A.; Lozes, Richard L.; Nistler, John L.; Arnold, William H.; Kyser, David F.; Minvielle, Anna Maria; Preil, Moshe E.; Singh, Bhanwar; Templeton, Michael K.; Arnold, William H.

Publisher

SPIE

Published

1991

Language

EN